S

Suraj Patil

Business Analyst

Bengaluru, Karnataka, India9 mos experience

Key Highlights

  • Proven ability to improve engineering processes.
  • Strong background in semiconductor research.
  • Experience in project management and teamwork.
Stackforce AI infers this person is a Semiconductor Research Engineer with strong analytical and project management skills.

Contact

Skills

Core Skills

ResearchEngineering

Other Skills

Capacitance measurementComsol-MultiphysicsDeep Reactive Ion EtchingDirect CurrentLeadershipManagementMicrosoft ExcelMicrosoft OfficeMicrosoft WordProject ManagementRadio frequencyTSV technologyTeamworkThermal analysis

Experience

Hsbc global banking and markets

Business Analyst

Jun 2018Apr 2019 · 10 mos · Bengaluru Area, India

Sumitomo precision products co., ltd. - japan

Intern

May 2017Jul 2017 · 2 mos · Hyogo, Japan

  • Deep Reactive Ion Etching (Minimal)
  • Performed experiments on Deep Reactive Ion Etching machine funded by Japanese Government
  • Proposed application of Radio frequency and Direct Current through DC electrodes to increase efficiency
  • Avoided coupling loss between electrodes and ground by using spacers made of plastic by 3D image printer
  • Improved the etch rate for Electrostatic Clamping by 200% from 100nm/min to 300nm/min
  • Minimal Wafer and Chamber Temperature
  • Replaced match and source generator with one having thermocouple to measure temperature while processing
  • Implemented low pass filter to remove noisy Radio frequency signals of source(100MHz) and bias(13MHz)
  • Matched source using trimmer capacitor and analysed data which was verified by thermal dots
  • Discovered that excess temperature was not a root cause for Minimal shut down at customer’s site

Indian institute of technology, hyderabad

Research Intern

May 2016Jul 2016 · 2 mos · Hyderabad Area, India

  • Improved noise coupling using Teflon liner in TSVs
  • Simulated models using Comsol-Multiphysices with both SiO2 and Teflon AF1600 as liner in TSVs
  • Chip level integration using TSVs with Teflon AF1600 as liner material resulted in improved noise coupling
  • Performance of TSVs enhanced by 5% compared to conventional SiO2 based liner
  • Detection of Ammonia gas using Modified MOS capacitor
  • Fabricated Modified MOS capacitor using standard CMOS process flow
  • Utilized carbonized polymer film by pyrolysis as insulator in place of metal oxide in modified MOS capacitor
  • Implemented X-Ray Diffraction spectroscopy to confirm that residue obtained is amorphous carbon
  • Measured capacitance change by Precision impedance analyzer result in successful detection of ammonia gas

Education

Indian Institute of Technology, Kanpur

Bachelor of Technology - BTech — Electrical and Electronics Engineering

Jan 2014Jan 2018

Heliger Borden Education Centre

Senior High School

Jan 2011Jan 2013

Kendriya Vidhyalaya Khandwa

High School

Jan 2007Jan 2011

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